Kev piav qhia
Epitaxial Silicon Waferlos yog EPI Silicon Wafer, yog ib tug wafer ntawm semiconducting siv lead ua txheej tso rau hauv lub polished crystal nto ntawm silicon substrate los ntawm epitaxial loj hlob.Cov txheej txheem epitaxial yuav yog cov khoom siv tib yam li cov substrate los ntawm homogeneous epitaxial kev loj hlob, los yog ib txheej kab txawv nrog cov kev xav tau zoo los ntawm heterogeneous epitaxial kev loj hlob, uas tau txais kev loj hlob ntawm epitaxial technology suav nrog cov tshuaj vapor deposition CVD, kua theem epitaxy LPE, nrog rau molecular beam. epitaxy MBE kom ua tiav qhov zoo tshaj plaws ntawm qhov tsis xws luag thiab qhov zoo ntawm qhov roughness.Silicon Epitaxial Wafers feem ntau yog siv rau hauv kev tsim cov khoom siv hluav taws xob siab tshaj plaws, cov khoom siv semiconductor sib xyaw ua ke ICs, cov khoom siv hluav taws xob thiab cov khoom siv hluav taws xob, kuj siv rau cov khoom siv ntawm diode thiab transistor lossis substrate rau IC xws li hom bipolar, MOS thiab BiCMOS li.Tsis tas li ntawd, ntau txheej epitaxial thiab tuab zaj duab xis EPI silicon wafers feem ntau siv hauv microelectronics, photonics thiab photovoltaics daim ntawv thov.
Kev xa khoom
Epitaxial Silicon Wafers los yog EPI Silicon Wafer ntawm Western Minmetals (SC) Corporation tuaj yeem muaj qhov loj ntawm 4, 5 thiab 6 nti (100mm, 125mm, 150mm inch), nrog kev taw qhia <100>, <111>, epilayer resistivity ntawm <1ohm -cm los yog mus txog 150ohm-cm, thiab epilayer thickness ntawm <1um los yog mus txog 150um, kom txaus siab rau ntau yam kev cai nyob rau hauv nto tiav ntawm etched los yog LTO kev kho mob, packed nyob rau hauv cassette nrog carton box sab nraum, los yog raws li customized specification rau lub zoo meej tov. .
Technical Specification
Epitaxial Silicon Waferslos yog EPI Silicon Wafer ntawm Western Minmetals (SC) Corporation tuaj yeem muaj qhov loj ntawm 4, 5 thiab 6 nti (100mm, 125mm, 150mm txoj kab uas hla), nrog kev taw qhia <100>, <111>, epilayer resistivity ntawm <1ohm-cm los yog mus txog 150ohm-cm, thiab epilayer thickness ntawm <1um los yog mus txog 150um, kom txaus siab rau ntau yam kev cai nyob rau hauv nto tiav ntawm etched los yog LTO kev kho mob, packed nyob rau hauv cassette nrog thawv thawv sab nraum, los yog raws li customized specification rau lub zoo meej tov.
Cim | Si |
Atomic Number | 14 |
Atomic hnyav | 28.09 Nws |
Qeb Element | Metalloid |
Pawg, Lub Sijhawm, Thaiv | 14, 3, ib |
Crystal qauv | Pob zeb diamond |
Xim | Tsaus grey |
Melting Point | 1414 ° C, 1687.15 K |
Boiling Point | 3265 ° C, 3538.15 K |
Qhov ceev ntawm 300K | 2.329 g / cm33 |
Intrinsic resistivity | 3.2E5 Ω-cm |
CAS Nr | 7440-21-3 : kuv |
EC Number | 231-130-8 : kuv |
Tsis muaj. | Cov khoom | Txheem Specification | ||
1 | Cov yam ntxwv dav dav | |||
1-1 | Loj | 4" | 5" | 6" |
1-2 | Txoj kab uas hla mm | 100 ± 0.5 | 125 ± 0.5 | 150 ± 0.5 |
1-3 | Kev taw qhia | <100>, <111> | <100>, <111> | <100>, <111> |
2 | Epitaxial Layer yam ntxwv | |||
2-1 | Txoj Kev Loj Hlob | CVD | CVD | CVD |
2-2 | Hom conductivity | P lossis P +, N / lossis N + | P lossis P +, N / lossis N + | P lossis P +, N / lossis N + |
2-3 | Thickness μm | 2.5-120 Nws | 2.5-120 Nws | 2.5-120 Nws |
2-4 | Thickness Uniformity | ≤ 3% | ≤ 3% | ≤ 3% |
2-5 | Resistant Ω-cm | 0.1-50 | 0.1-50 | 0.1-50 |
2-6 | Resistivity Uniformity | ≤ 3% | ≤ 5% | - |
2-7 | Dislocation cm-2 | <10 | <10 | <10 |
2-8 | Nto Zoo | Tsis muaj nti, haze lossis txiv kab ntxwv tev, thiab lwm yam. | ||
3 | Kov Substrate yam ntxwv | |||
3-1 | Txoj Kev Loj Hlob | CZ | CZ | CZ |
3-2 | Hom conductivity | P/N | P/N | P/N |
3-3 | Thickness μm | 525-675 : kuv | 525-675 : kuv | 525-675 : kuv |
3-4 | Thickness Uniformity max | 3% | 3% | 3% |
3-5 | Resistant Ω-cm | Raws li xav tau | Raws li xav tau | Raws li xav tau |
3-6 | Resistivity Uniformity | 5% | 5% | 5% |
3-7 | TVV max | 10 | 10 | 10 |
3-8 | Taub μm max | 30 | 30 | 30 |
3-9 | Warp μm max | 30 | 30 | 30 |
3-10 | EPD cm-2 max | 100 | 100 | 100 |
3-11 | Ntug Profile | Rounded | Rounded | Rounded |
3-12 | Nto Zoo | Tsis muaj nti, haze lossis txiv kab ntxwv tev, thiab lwm yam. | ||
3-13 | Back Side Finish | Etched lossis LTO (5000 ± 500Å) | ||
4 | Ntim | Cassette sab hauv, thawv thawv sab nraum. |
Silicon Epitaxial WafersFeem ntau yog siv rau hauv kev tsim cov khoom siv hluav taws xob siab tshaj plaws, kev sib xyaw ua ke ntawm cov khoom siv semiconductor ICs, cov khoom siv hluav taws xob thiab cov khoom siv hluav taws xob, kuj siv rau lub caij ntawm diode thiab transistor lossis substrate rau IC xws li hom bipolar, MOS thiab BiCMOS li.Tsis tas li ntawd, ntau txheej epitaxial thiab tuab zaj duab xis EPI silicon wafers feem ntau siv hauv microelectronics, photonics thiab photovoltaics daim ntawv thov.
Cov lus qhia txog kev yuav khoom
Epitaxial Silicon Wafer